Layout Optimiser For Multi-Signature Jobs At Ipex

Positive Focus will preview its Metrix 2.0, supporting multi-signature bound jobs at Ipex 2006.

Positive Focus will preview its Metrix 2.0, supporting multi-signature bound jobs at Ipex 2006.

Lithotechnics will be demonstrating the forthcoming version of the Metrix layout optimiser on its stand in the JDF Pavilion and Positive Focus will also show it on its stand - stand 20-D45, hall 20.

Version 2.0 incorporates all the ganging technology of Metrix but will automatically calculate multi-signature bound jobs, directly from JDF or operator input, said Positive Focus.

Metrix 2.0 extends job planning automation, so it transforms the laborious layout planning process in to a quick and easy step in the print production workflow, added the company.

Rohan Holt, Lithotechnics founder, said: "Metrix is unlike any job planning system on the market.

We designed Metrix with clear goals - ease of use was of paramount importance.

Secondly, we wanted to facilitate just-in-time production decisions, so we designed editing to be dynamic and intelligent." He continued: "We tackled the most difficult type of work - ganging - first, because we knew it would be a rock-solid foundation for the future.

Now, with book work added, Metrix users will benefit from the best of both worlds." Ivor Dixon, of UK distributor Positive Focus is enthusiastic about the news: "We, and our customers, have been waiting for this facility of handling multiple signatures and multiple layouts.

Now, with one product, commercial printers can work with ganged flat and folded jobs and conventional bound work.

With ganged work we can roll-over on to a second or third sheet if the layout does not fit conveniently on the first sheet.

That has been one of the most requested features on the wish list." He added: "Although this is a technology preview, not a demonstration of the product that will finally be available, it will show how Rohan and his team have been developing the product and the way we consider imposition will fundamentally change, from today." The company believes that Metrix completes the productivity loop by exporting the layout in JDF format, including all PDF content, press sheet geometry and marks, to JDF-enabled workflows and JDF-enabled RIPs, as well as to JDF and CIP3 capable finishing equipment.

Metrix 2.0 will be a free upgrade for anyone purchasing the current version following this announcement, added the company.

Product details and planned shipping date have not yet been released.

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